Optical methods in thin-film technologies

Mercoledì 1/12/2021, con inizio alle ore 15:00, su MsTeams (link per la connessione), il Prof. Dr hab. Janusz Jaglarz (Cracow University of Technology, Poland) terrà un seminario dal titolo Importance of optical research methods in thin-film technologies on the example of amorphous layers produced by CVD methods.

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Abstract. Amorphous layers obtained by chemical vapour deposition (CVD) method exhibit similar properties to  a-silicon but they show much  better dielectric behaviour. They exhibited amorphous structure and they have very hight refractive indices. The layers, presented in this work may potentially have broad applications in optoelectronics, photovoltaics and photonics.  Optical research methods allow to accurately assess the influence of technological parameters and external parameters on the physicochemical properties of the created layers. In my presentation I will present the usefulness of optical metrology of thin films in layer  technologies. Also the results of thermal processes (optical hysteresis) will be presented.